Past Events

This group training event will focus on the basic theory and operation of the Bruker Dektak DXT-A Stylus Profilometer 
Users will learn about specifics of the instrument capabilities and strategies for data collection and data quality improvement. Users can bring their own (non-hazardous) samples for this training. We will work together until we are both comfortable with your safe and successful operation of the instrument in a shared facility environment. This is usually one session <2hours. Full independent tool access will be granted upon completion of this training session.
 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

Date: Wednesday, March 20, 2024
Time: 9:30 a.m. – 4:30 p.m. ET
Location: 12-0168 (MIT.nano basement)
Lunch will be provided to registered participants, sponsored by Zeiss

There will be an image contest during lunch. We invite you to submit your best image taken using the Zeiss field emission SEMs at MIT.nano for a chance to win a pair of Zeiss binoculars. Please provide a short description of your image and the imaging conditions.

Register for this talk

ABSTRACT

9:30AM-10:15AM
What to like about imaging with Gemini optics in ZEISS field-emission SEMs
Sandip Basu, Product Marketing Manager, Carl ZEISS Microscopy

Join us as we unravel the transformative potential of surface-sensitive imaging in unlocking new frontiers across various scientific disciplines.

In recent years, the significance of surface-sensitive imaging has surged within the realm of electron microscopy. Understanding when, why and how to image surfaces at low beam energy without compromising resolution integrity and repeatability is crucial for many application fields. 

In this presentation, we will delve into the essential nuances of achieving reliable, repeatable low-voltage imaging, alongside exploring pivotal examples to illuminate its practical applications. We'll analyze the primary challenges inherent in attaining optimal resolution and harnessing unique contrast mechanisms that benefit low-voltage imaging. Moreover, we'll navigate through the intricacies of implementing these techniques within Zeiss field-emission SEMs, contextualizing their relevance across diverse domains such as nanofabrication, energy, healthcare, and semiconductor applications. 
 

10:15AM-11:30AM
Advanced imaging modes in ZEISS field-emission SEMs
Jeff Marshman, Sr. Applications Engineer, Carl ZEISS Microscopy
Anthony Lisi, Product Applications Sales Specialist, Carl ZEISS Microscopy 

Advanced imaging modes have become increasingly important in the field of scanning electron microscopy (SEM). Zeiss field emission SEMs offer a range of high-resolution imaging techniques, including a selection of BSE imaging, high-contrast high-resolution imaging in variable pressure (VP) mode, high-angle annular dark field (HAADF) imaging in STEM mode, and cathodoluminescence (CL).

In this presentation, we will discuss how the beam stability and ease-of-use in switching between imaging and analytics mode in the Zeiss FE-SEMs with dual-condenser electron optic column help in better detection efficiency for energy dispersive X-ray spectroscopy (EDS), and electron backscatter diffraction (EBSD). These techniques allow for the characterization of materials at a micro- and nanoscale, providing detailed information on composition, crystal structure, and morphology. 

In addition, Zeiss field emission SEMs offer the ability to perform in situ experiments, such as heating or cooling samples, to observe dynamic changes in material properties. These advanced imaging modes are critical for researchers in a variety of fields, including materials science, nanotechnology, and biology.

11:30AM-12PM
In Situ SEM Mechanical Characterization of 3D Micro-Architected Materials
James U. Surjadi, Carlos M. Portela, Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA

Micro-architected materials represent a new paradigm of materials which provide a pathway to defy the limitations of traditional monolithic materials through their engineered internal microstructures, allowing them to exhibit unique and extreme properties, such as high strength at ultralow densities or large ductility/stretchability from brittle constituents. However, understanding their mechanical response is not trivial, owing to their complex and micro/nano-scale features. Our in situ SEM nanomechanical testing setup serves as a powerful tool, enabling us not only to visualize their deformation behavior during mechanical loading (e.g., compression, tension) but also to capture corresponding force-displacement curves. This capability provides us with the means to conduct a comprehensive analysis of their mechanical properties. One example of such analysis, impossible without in situ SEM mechanical characterization, is that of our recently proposed 3D woven micro-architected materials. These materials are unique, as they are compliant and highly stretchable (up to 10 times more stretchable than its constituent bulk material), but their mechanics involve numerous frictional self-contact due to entanglements between the woven fibers. In situ mechanical testing enables us to observe how these complex architected materials deform, making it possible to model and optimize the design of these architectures. Overall, visualizing and understanding the mechanical response of these micro-architected materials could potentially open new avenues for the creation of unique materials such as flexible glass/ceramics/semiconductors, ultra-light metals with rubber-like response, and scalable nanomaterials for next-generation engineering devices.

12:00PM-1PM Lunch (sponsored by Zeiss) and image contest 

1PM-4PM Hands-on Demonstration: Best practices for superior imaging and analytics using ZEISS field-emission SEMs 
Jeff Marshman, Sr. Applications Engineer, Carl ZEISS Microscopy

This training event will focus on the basic imaging and operation of the Bruker Icon AFM available at MIT.nano Characterization Facilities. Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. Users can bring their own samples for this training and SPM probes are provided. Notice, users must supply their own probes for followup qualification sessions. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff member during this small group training.

The Icon XR has many SPM modes including contact and PeakForce tapping mode with ScanAsyst, Magnetic Force Microscopy, Piezo Force Microscopy, conducting atomic force microscopy (AFM). There are also additional features such as electrical characterization from 80 fA to 1 uA with 10 nm spatial resolution, Kelvin Force Probe Microscopy with amplitude or frequency feedback, and pixel-by-pixel quantitative force characterization to probe material properties. Following the basic training session, users can coordinate an advanced mode specific training with the MIT.nano staff.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

The Wet Chemical Process Training provides an introduction for all work with liquid chemicals in Fab.nano. Completion is required for any use of fume hoods or wet benches (including solvents, hands-on training for spin coaters, corrosive hoods and wet benches).

The training is also a prerequisite for 24-hour access to the Fab.nano facility, as it provides the relevant safety foundations.

The PANalytical X'Pert Pro diffractometer is an excellent choice for X-ray powder diffraction (XRPD). The default mode of this instrument is in Bragg-Brentano parafocusing geometry, which is used for polycrystalline materials. We usually keep a linear position sensitive detector on the instrument, which permits rapid data collection for angles higher than 4 degrees 2Theta.

The basic instrument training session will focus on the collection of powder diffraction data using the high-speed optics, which consist of programmable divergence slits and X'Celerator high-speed detector, and the Open Eularian Cradle (OEC) sample stage. This configuration is best suited for high-speed high-resolution data collection from powders and polycrystalline thin films.

Accessories include several different sample stages and optics. After you have completed this training, you can request individaul training on the other configurations available with this instrument. There are three other sample stages that are available: (1) the 15 position automatic sample changer, (2) the furnace that can heat samples up to 1200 C, and (3) the cyrostat that can cool samples down to 11 K. The PANalytical also can be configured parallel-beam optics for grazing incidence X-ray diffraction (GIXD). After you have completed the basic training, you can request individual training on using the other configurations.

Users of this instrument should also strongly consider taking a data analysis course to suit their needs, such as the line profile fitting course for crystallite size and microstrain analysis, the Rietveld refinement series for quantitative phase analysis and unit cell analysis, or the Introduction to High Score Plus for qualitative phase identification and database search techniques.
 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA HD VP available at Characterization.nano. Users will learn about specifics of the instrument configurations, different imaging detectors available and strategies for image quality improvement. We'll use standard sample for this training. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff me. 

Active MIT.nano user account  (MUMMS) is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic theory and operation of the Fourier Transform Infrared Spectrometer 
Users will learn about specifics of the instrument configurations, available accessories and strategies for data collection and data quality improvement. Users can bring their own (non-hazardous) samples for this training in whatever form is convenient. We will work together until we are both comfortable with your safe and successful operation of the instrument in a shared facility environment. This is usually one session <2hours. Full independent tool access will be granted upon completion of this training session.
 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

All users without previous cleanroom work experience are required to take the quick-start training. Waivers for prior experience will be handled during the Fab.nano orientation.

The quick-start provides hands-on training to new users, by following through a simple 1-mask process in a small group. You will gain familiarity with entering the lab, handling samples, learn about deposition, lithography and etch tools, and how to verify process results.

An active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

Because we are working in the lab, please wear long pants and full shoes

Please have the Fab.nano Orientation completed before the quick-start event.

This training event will focus on the basic imaging and operation of the Cypher S and VRS AFM's available at MIT.nano Characterization Facilities. Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. Users can bring their own samples for this training and SPM probes are provided. Notice, users must supply their own probes for followup qualification sessions. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

The orientation consists of a series of self-paced videos to watch, and a 30-minute check-in over zoom, where we provide an introduction, answer questions about the lab & capabilities and how to get started, and check for any missing trainings. All cleanroom and packaging space users need to complete the orientation before card access can be granted.

Users with no prior cleanroom experience also take a half-day “quick-start” class, which provides a hands-on experience in core methods (deposition, lithography, etch). Users with prior cleanroom experience will receive a waiver during the orientation check-in. If you only need to use the packaging space (and not the cleanroom), the quick-start is not needed.

Registering for the orientation, you will get a chance to describe your general fabrication needs, helping us better understand each user’s goals and expectations. The registration form also contains a checklist to help you spot any missing EHS trainings.

After registering, you will get an email with a link to the videos to watch, and the zoom link to the orientation event.