Lab Documentation
MIT.nano Policy and References
MIT.nano Wet Chemical Training Course Material
MIT.nano Spin Coaters and Chemicals
Tool and Instrument Procedures
| Tool Name (link to SOP) | Process Category | Tool Location |
|---|---|---|
| ALD-Plasma-Arradiance-XTDP | Deposition ALD | U8 |
| Asher-Chuck-ESI | Etch | L6 |
| CoatDevelop-picoTrack | Litho | L8 |
| Coldplate-Solvent | Litho | L10 |
| Diesaw-DAD3240 | Packaging | Level 5 |
| DirectWrite-MLA150-OptAF | Litho | L8 |
| DRIE-SPTS-Pegasus | Etch | U6 |
| DRIE-STS-MMPLEX | Etch | U6 |
| EBeam-AJA | Deposition PVD | U8 |
| PECVD-Samco-PD220 | Deposition CVD | U8 |
| PECVD-STS-MMPLEX | Deposition CVD | U8 |
| RIE-2Chamber-AMAT-P5000 | Etch | L6 |
| RIE-Cl2-Samco-200iP | Etch | U6 |
| RIE-F-Samco-230iP | Etch | U6 |
| RIE-Mixed-SAMCO-230iP | Etch | U6 |
| RTA-1100C-ASMicro | Diffusion | L2 |
| RTA-1100C-ASOne150 | Diffusion | L2 |
| RTA-1300C-ASOne150 | Diffusion | L2 |
| RTA-1300C-ASOne150-5Gas | Diffusion | L2 |
| Sputter-AJA-LL | Deposition PVD | U8 |
| VaporEtch-XeF2 | Etch | U4 |