Fab.nano is the shared fabrication facility at MIT where users carry out controlled processing of micro- and nanoscale structures. We oversee space and equipment in three locations:
- In Building 12 (map), the fab comprises nearly 50,000 square feet of Class 100/1,000/10,000 cleanroom, occupying the first and third floors of MIT.nano. There are also packaging and other capabilities in the fifth-floor prototyping space.
- Building 39 (map) facilities consist primarily of three cleanroom labs—ICL, TRL, and EML—offering varying degrees of flexibility and cleanliness levels.
- Building 24 (map) is home to the electron-beam lithography (EBL) facility.
Fab.nano offers numerous tools for use by any researcher trained to use our facilities. Some individuals may come to build an entire device, while others may need to use the fab for only one portion of their project. Researchers from many different departments can work side by side, sharing the equipment and learning from each other’s processes.
Fab.nano equipment and process design
Your guide for navigating the equipment and spaces is the Fab.nano user interface. This web-based platform:
- Details the full set of toolsets across different process categories (e.g, deposition, etching, lithography);
- Specifies a tool's equipment, technical staff, base cost, and other information
- Allows you to build a process, and hosts a process database
Visit the Fab.nano user interface
Steps to using the cleanroom and fabrication tools
First, follow these steps to become a user.
Once you are a trained user of the facility and have reviewed the user policies, you can build a process for what you would like to accomplish. During this time, MIT.nano tool specialists will guide you in choosing the best tools for your specific project. Once your process has been approved by the Processing Technology Committee (PTC), you will be trained on the necessary equipment and can begin working in the cleanroom.
Charges
- Monthly lab Identicard fee (needed to access bldg 39): $10
- Process charges: See costs chart
- Computer account: ~$30
- Wafer purchase: market price
Using outside resources
If you will be bringing outside resources into MIT.nano's facilities (photomasks, ion implants, and/or specialty wafers), please learn more about the processes and recommended vendors here.
200mm Prototyping Facility
MIT Lincoln Laboratory’s Microelectronics Laboratory (ML) is a 200 mm wafer processing facility, equipped with commercial-class cassette-to-cassette fabrication equipment and professionally staffed 24 hours a day, five days a week. This 90 nm-class facility operates full-flow fabrication across a broad range of integrated circuit technologies, including FD-SOI CMOS, CCD imagers, superconducting electronics, photonics, MEMs, and microfluidics.
MIT.nano collaborates with Lincoln Laboratory to offer the ML's prototyping services to companies. Read more about this facility.