This page contains data for the different EBL resists available at MIT.nano, typically the manufacturer's datasheet and safety data sheet, as well as spin curves obtained with spinner-EBL. Note that these spin curves will be more exact, since they have been measured on our spinner.
The spin curves include an interpolation function that can be used to calculate the spin speed necessary for a particular thickness.
Some useful links on spinning:
- MIT.nano spin-coaters and chemicals
- Models of spin coating
- Characteristics of resist films produced by spinning - Meyerhofer 78
PMMA
Papers
- Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography
- Development characteristics of polymethyl methacrylate in alcohol/water mixtures: a lithography and Raman spectroscopy study
Spin curves
Conditions:
- Small samples
- Spread at 750 rpm for 5 s, accelerate at 10 krpm/s to final speed, 60 s at final speed
- Bake on hotplate at 180 deg. C for 120 s.
Note: PMMA-950K-A8 at 6krpm produced very poor results.
HSQ
Spin curves
Conditions:
- Small samples
- Spread at 750 rpm for 5 s, accelerate at 10 krpm/s to final speed, 60 s at final speed
- Bake on hotplate at 90 deg. C for 120 s.
CSAR 62.09
Spin curve
Conditions:
- Small samples
- Spread at 750 rpm for 5 s, accelerate at 10 krpm/s to final speed, 60 s at final speed
- Bake on hotplate at 150 deg. C for 60 s.
ma-N 2400
Spin curves
Conditions:
- Small samples
- Spread at 750 rpm for 5 s, accelerate at 10 krpm/s to final speed, 60 s at final speed
- Bake on hotplate at 90 deg. C for 60 s.
ZEP
Spin curves
Conditions:
- Small samples
- Spread at 750 rpm for 5 s, accelerate at 10 krpm/s to final speed
- Bake on hotplate at 180 deg. C for 90 s.
