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PHI VersaProbe II X-ray Photoelectron Spectrometer

XPS allows elemental and chemical analysis of both conductive and insulating materials

High depth resolution and good elemental sensitivity. Samples are analyzed in an ultra-high-vacuum chamber (some specialized instruments allow surface analysis at near-atmospheric pressure).  Changes in surface elemental composition with depth can be documented nondestructively by recording composition while varying sample tilt relative to the analyzer (this technique is called angle-resolved depth profiling). Compositional changes with depth down to a few hundred nm can be documented by recording composition while using an ion gun to gradually remove surface layers. The spatial distribution of elements or chemistries on a surface can be mapped as well, with ultimate lateral resolution defined by the XPS instrument used.

MIT.nano’s PHI Versaprobe II XPS has a floating voltage argon single-ion gun for depth profiling and a cluster-ion C60 gun as well. The cluster-ion gun permits depth profiling softer materials which would be too damaged by single-ion bombardment. Other features of this XPS are a portable transfer vessel so that processed samples can be loaded into the XPS without exposure to air; an in situ heat/cold stage; and X-ray induced secondary electron imaging (SXI), which aids significantly in setting up for small area analysis. 

Specifications/Capabilities
  • Source:  Monochromated Al K-alpha X-radiation
  • Signal:  photoelectrons and Auger electrons
  • Operating vacuum range:  low 10-8 to 10e-9 Torr
  • Sample holder diameter:  25 mm or 60 mm 
  • Samples:  vacuum-compatible thin films, powders, or bulk materials
  • Compatible for conductive and insulating samples 
  • Maximum sample height:  1 cm
  • X-ray spot size:  10 um to 200 um 
  • Maximum analysis area:  1400 x 1400 um
  • Information depth:  1 to 10 nm
  • Elemental sensitivity:  0.1 to 0.01 atomic per cent


    Accessory in-situ holders

  • Ion guns:  Argon, C60 cluster source
  • Inert atmpsphere compatible transfer vessel with 25 mm sample holder
  • In situ heat/cold stage (-120C to 500C)
Applications
  • Elemental and chemical analysis of surfaces and interfaces
  • Depth profiling to a practical depth of few hundred nm
  • Chemical shifts information
  • Non distructive angle resolved analyses to the maximum depth of ~10nm
Staff/Contact

Libby Shaw         
13-4149                                      
60 Vassar Street            
Cambridge, MA                   

Charlie Settens, PhD
13-4013
60 Vassar Street (rear)
Cambridge, MA                   

CONTACT   

ASSISTED USE / TRAINING REQUEST

GROUP TRAININGS
 

PHI VersaProbe II X-ray Photoelectron Spectrometer
Reservation Rules

Only qualified users can reserve and use the instrument. 

Location

13-4137
60 Vassar Street (rear)
Cambridge, MA