Past Events

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA 300 SEM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging detectors available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA 300 SEM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging detectors available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic imaging and operation of the Jupiter XR AFM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging modes available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

The orientation consists of a series of self-paced videos to watch, and a 30-minute check-in over zoom, where we provide an introduction, answer questions about the lab & capabilities and how to get started, and check for any missing trainings. All cleanroom and packaging space users need to complete the orientation before card access can be granted.

Users with no prior cleanroom experience also take a half-day “quick-start” class, which provides a hands-on experience in core methods (deposition, lithography, etch). Users with prior cleanroom experience will receive a waiver during the orientation check-in. If you only need to use the packaging space (and not the cleanroom), the quick-start is not needed.

Registering for the orientation, you will get a chance to describe your general fabrication needs, helping us better understand each user’s goals and expectations. The registration form also contains a checklist to help you spot any missing EHS trainings.

After registering, you will get an email with a link to the videos to watch, and the zoom link to the orientation event.

All users without previous cleanroom work experience are required to take the quick-start training. Waivers for prior experience will be handled during the Fab.nano orientation.

The quick-start provides hands-on training to new users, by following through a simple 1-mask process in a small group. You will gain familiarity with entering the lab, handling samples, learn about deposition, lithography and etch tools, and how to verify process results.

An active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

Because we are working in the lab, please wear long pants and full shoes

Please have the Fab.nano Orientation completed before the quick-start event.

All users without previous cleanroom work experience are required to take the quick-start training. Waivers for prior experience will be handled during the Fab.nano orientation.

The quick-start provides hands-on training to new users, by following through a simple 1-mask process in a small group. You will gain familiarity with entering the lab, handling samples, learn about deposition, lithography and etch tools, and how to verify process results.

An active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

Because we are working in the lab, please wear long pants and full shoes

Please have the Fab.nano Orientation completed before the quick-start event.

This group training event will focus on the basic imaging and operation of the Jupiter XR AFM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging modes available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

This group training event will focus on the basic imaging and operation of the Jupiter XR AFM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging modes available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

The orientation consists of a series of self-paced videos to watch, and a 30-minute check-in over zoom, where we provide an introduction, answer questions about the lab & capabilities and how to get started, and check for any missing trainings. All cleanroom and packaging space users need to complete the orientation before card access can be granted.

Users with no prior cleanroom experience also take a half-day “quick-start” class, which provides a hands-on experience in core methods (deposition, lithography, etch). Users with prior cleanroom experience will receive a waiver during the orientation check-in. If you only need to use the packaging space (and not the cleanroom), the quick-start is not needed.

Registering for the orientation, you will get a chance to describe your general fabrication needs, helping us better understand each user’s goals and expectations. The registration form also contains a checklist to help you spot any missing EHS trainings.

After registering, you will get an email with a link to the videos to watch, and the zoom link to the orientation event.

3D printing glass with metastable silicates

Tuesday, February 8, 2022
11 a.m. – 11:45 a.m. EST
>>Register for this Zoom webinar.

Devon Beck, Assistant Staff
Advanced Materials and Microsystems Group
MIT Lincoln Laboratory

Additive manufacturing of glass allows the fabrication of complex structures and geometries that traditional approaches cannot achieve. However, current strategies for 3D printing glass require thermal processes over 1000°C to produce functional parts.

Beck will describe the development of low temperature process to 3D print glass and multimaterial composite glasses based on metastable silicate chemistry. The direct-write deposition process occurs at room temperature and the curing process only requires 250°C to achieve a stable glass structure. The properties of the printed glass can further be tailored in a plug-and-play fashion by introducing functional filler materials such as conductive particles.

This straight-forward strategy will enable the fabrication of a wide variety of microfluidic, electronic, and radio frequency devices with higher thermal stability without the need for extensive thermal processing.