Past Events

The orientation consists of a series of self-paced videos to watch, and a 30-minute check-in over zoom, where we provide an introduction, answer questions about the lab & capabilities and how to get started, and check for any missing trainings. All cleanroom and packaging space users need to complete the orientation before card access can be granted.

Users with no prior cleanroom experience also take a half-day “quick-start” class, which provides a hands-on experience in core methods (deposition, lithography, etch). Users with prior cleanroom experience will receive a waiver during the orientation check-in. If you only need to use the packaging space (and not the cleanroom), the quick-start is not needed.

Registering for the orientation, you will get a chance to describe your general fabrication needs, helping us better understand each user’s goals and expectations. The registration form also contains a checklist to help you spot any missing EHS trainings.

After registering, you will get an email with a link to the videos to watch, and the zoom link to the orientation event.

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA 300 SEM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging detectors available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

Oxford Instruments Asylum Research is holding a day-long, in-person workshop with morning presentations (12-0168 and on zoom) and afternoon hands-on applications topics (12-0145). Please join us for a day of getting more familiar with the Asylum Research AFMs at MIT.nano.

What can I measure with an Atomic Force Microscope?
Advanced AFM Modes for Materials Characterization

LOCATION: 12-0168 and Zoom
TIME: 9:30AM - 10:30AM
SPEAKER: Ted Limpoco, Ph.D., Senior Applications Scientist, Oxford Instruments Asylum Research

Atomic force microscopes (AFMs) are fundamentally visualization tools with the ability to routinely resolve topographic features of surfaces at the nanometer scale. At its highest performance, AFMs can resolve even atomic lattices and point defects. AFMs also use a mechanical probe, such that it essentially “touches” the surface, so we can obtain more information than just topography. Contact or proximity to the surface enable us to measure material properties, such as mechanical, electrical, and magnetic properties. Since the probe tip is very small, we can get very local information, mapping this on surface topography with nanometer detail. AFMs have thus become an indispensable tool in nanotechnology research.

In this presentation, we will survey advanced AFM modes that measure properties such as Young’s modulus, adhesion, and viscoelastic response (force curves, FFM, AMFM, DART-CR); current (CAFM); surface potential and work function (KPFM or SKPM); electric charge and magnetic field (EFM and MFM); capacitance, as well as dopant levels and type (SCM); and, finally, electromechanical or piezoelectric response (DART™-PFM). In the process, we will touch on advances in multi-frequency modes (DART™, AM-FM), modern methods of cantilever excitation (blueDrive™ photothermal excitation), capturing biomolecular dynamics (video-rate scanning), and imaging under environmental control.

These various measurement modes, combined with its ultrahigh resolution, highlight the strength and versatility of AFMs in materials characterization and nanotechnology research.

Overview of JupiterXR and Cypher S ES/ VRS AFMs at MIT.nano

LOCATION: 12-0168 and Zoom
TIME: 10:30AM-11:30AM
SPEAKER: Ryan Fuierer, Ph.D. Oxford Instruments Asylum Research

A general overview of the hardware components of both the JupiterXR and Cypher AFMs will be presented. The anatomy of each AFM system will be described, along with the proper handling and identification of tool components including probe holders, sample cells and scanners. A general overview of the AFM software navigation will also be presented.

Break: 11:30AM-12:30PM

Afternoon hands-on workshop for most common applications using the Cypher AFM

LOCATION: 12-0145
PRESENTER: Ted Limpoco, PhD. Oxford Instruments Asylum Research

Time Slot 1 (12:30PM-1:30PM): Topography Best Practices

 Description: This segment will offer a hands-on approach for contact mode and AC (Tapping) mode techniques, and support the value of monitoring the AC phase signal during imaging to control tip sample forces.

Time Slot 2 (1:30PM-2:30PM): PiezoResponse Force Microscopy (PFM)

Description: This segment will feature examples of techniques associated with piezo force microscopy, specifically how dual frequency AC resonant tracking PFM eliminates topographic crosstalk while maintaining optimal signal to noise in PFM imaging.

Time Slot 3 (2:30PM-3:30PM): NanoElectrical Techniques: cAFM, EFM, KPFM

Description: This segment will provide hands-on examples of common nanoelectrical best practices for techniques such as conductive AFM, Electrostatic Force Microscopy and Kelvin Probe Force Microscopies.

Time Slot 4 (3:30PM-4:30PM): Nanomechanical mapping techniques

Description: This segment will feature an overview of the nanomechanical mapping modes on the Asylum Research AFMs, and when to use them. This will include AM-FM viscoelastic imaging, fast force mapping, and contact resonance imaging techniques.

This group training event will focus on the basic imaging and operation of the Jupiter XR AFM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging modes available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA 300 SEM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging detectors available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

All users without previous cleanroom work experience are required to take the quick-start training. Waivers for prior experience will be handled during the Fab.nano orientation.

The quick-start provides hands-on training to new users, by following through a simple 1-mask process in a small group. You will gain familiarity with entering the lab, handling samples, learn about deposition, lithography and etch tools, and how to verify process results.

An active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

Because we are working in the lab, please wear long pants and full shoes

Please have the Fab.nano Orientation completed before the quick-start event.

The orientation consists of a series of self-paced videos to watch, and a 30-minute check-in over zoom, where we provide an introduction, answer questions about the lab & capabilities and how to get started, and check for any missing trainings. All cleanroom and packaging space users need to complete the orientation before card access can be granted.

Users with no prior cleanroom experience also take a half-day “quick-start” class, which provides a hands-on experience in core methods (deposition, lithography, etch). Users with prior cleanroom experience will receive a waiver during the orientation check-in. If you only need to use the packaging space (and not the cleanroom), the quick-start is not needed.

Registering for the orientation, you will get a chance to describe your general fabrication needs, helping us better understand each user’s goals and expectations. The registration form also contains a checklist to help you spot any missing EHS trainings.

After registering, you will get an email with a link to the videos to watch, and the zoom link to the orientation event.

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA 300 SEM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging detectors available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA 300 SEM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging detectors available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic imaging and operation of the Jupiter XR AFM available at the MIT.nano cleanroom. Users will learn about specifics of the tool configuration, different imaging modes available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of an additional one-on-one supervised use session that will be coordinated with the staff member during this small group training.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.