Materials Prep Equipment is spread across buildings 13 and 12 and aimed to enable sample preparation for imaging and characterization.
Training on Materials Prep equipment is offered in conjunction with relevant Characterization.nano instrumentation.
Following instruments are available:
13-1036
- EMS150T Sputter_Coater
- FISCHIONE 1010 ION MILL
- GATAN PIPS
13-1036 Equipment Training Request
13-4139
- Freeze Stage
- Micro Balance
- Plasma Cleaner
- UV-Ozone Cleaner
- Axioskop Optical Microscope
SZX16 Optical Microscope
12-0143
PMultiPrep Precision Polishing System
The MultiPrep System (8") enables precise polishing sample preparation of a wide range of materials for microscopic (optical, SEM, FIB, TEM, AFM, etc.) evaluation. More information here.
TechCut 4x Precision Low Speed Saw
The TechCut 4x is a precision low-speed saw excellent for cutting small, delicate samples that cannot tolerate increased heat caused by high-speed sectioning. More information here.
FISCHIONE 1051 TEM Mill
The 1051 TEM Mill is for thinning of TEM specimens to electron transparency. The system includes: two independently adjustable TrueFocus ion sources; high energy operation for rapid milling; low energy operation for specimen polishing; ion source maintains its small beam diameter over a wide range of operating energies (100 eV to 6 keV); simple setup of milling parameters Individual, automatic ion source gas control; continuously adjustable milling angle range of ‒10 to +10 ̊; specimen rocking or rotation with ion beam sequencing; automatic termination; liquid nitrogen-cooled specimen stage.
PELCO SC-7 Sputter Coater
The PELCO SC-7 is a sputter coater that deposits a thin conductive metal layer onto a non-conductive scanning electron microscope sample to help reduce the build up of charging on the sample surface. The thin conductive metal layer provides a path to ground for electrons that have built up on the surface of a non-conducting sample while still being thin enough to not noticeably alter the surface topography of the sample.
Specifications/Capabilities:
• Sputter Target: Gold-Palladium (Au 60: Pd 40)
• Layer Thickness: 1.5 – 2.5 nm (20 seconds at 20 mA)
• 12 pin-mount sample holder
Limitations/Exclusions:
• Only for deposition of thin layers
• Not for use with volatile samples
• May have difficulty with very porous samples
VTI Glove Box
This glovebox features a nitrogen environment, three glove ports, custom extended mini chamber for TEM holder loading, touch screen for easy use; and oil-free scroll pump.
Zeiss Stemi 508 Stereomicroscope
Shel Lab Vacuum Oven