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FEI Helios Nanolab 600 Dual Beam System

Configured to carry out nano-scale characterization and nano-machining on a wide-range of materials from various study areas such as biotechnology, and materials and energy research. This instrument has magnetic immersion electron optics to give 0.9 nm resolution at 15kV. A high brightness field electron emitter can deliver a beam current up to 22 nA and the accelerating voltage from 350V to 30kV. The ion optics produces a resolution of 5.0 nm at 30KV and liquid Gallium emitter delivers 20 nA ion current and the voltage ranging from 0.5 kV to 30kV.

Staff/Contact

Zhenyuan Zhang PhD
13-1034

Anna Osherov, PhD
12-5005
MIT.nano (5th floor)
60 Vassar Street (rear)
Cambridge, MA

CONTACT

ASSISTED USE / TRAINING REQUEST
 

FEI Helios Nanolab 600 Dual Beam System
Location

13-1026
Build 13
60 Vassar Street (rear)
Cambridge, MA