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FIB-SEM VELION

VELION is a FIB-SEM instrument dedicated to nanofabrication where Focused Ion Beam (FIB) technology has matured into state-of-the-art instrumentation for nanofabrication and rapid prototyping. VELION comprises a top down mounted nanoFIB column perpendicular to a Laser Interferometer Stage with an attached FE SEM column. The instrument offers unique capabilities and is highly optimized for fabricating high resolution, 2D and 3D nanostructures.

Specifications/Capabilities

nanoFIB column:

  • Liquid Metal Alloy Ion Sources (LMAIS) providing Wien filtered ions for Gallium-free patterning (Au, Ge, Si)
  • High resolution patterning capabilities (min feature size < 15nm for Au/Si)
  • Fully corrected write fields (distortion, stigmation)
  • Long term current stability (up to days)

Laser Interferometer stage:

  • Mechanical movement at 1nm precision
  • Continuous stage modes for stitch free FIB patterning on full 4”wafer scale
  • Stitching and overlay accuracy:  < 50 nm (|mean|+3·sigma)

FE SEM

  • Process control for rapid prototyping

Additional Capabilities:  

  • Automated height sensing to detect sample surface height variation for automated correction
  • Pt GIS deposition
  • Nanomanipulator
  • Raith Nanosuite software incl. CAD (GDSII) navigation & patterning
Applications
  • Plasmonic devices
  • Meta materials
  • Localized Ion implantation
  • Nanophotonics
  • Waveguides
  • Fresnel lenses
  • Nanofluidics
  • Nanopore fabrication on waferscale
  • Large area FIB hard masking
  • Ga-free TEM-L prep
Resources

VELION FIB-SEM acquisition was enabled by National Science Foundation Major Research Instrumentation Program (NSF-MRI). Please make sure to acknowledge DMR-2117609 in any publication involving results originated from the use of the VELION.

Suggested language: " This work was performed in part on the Raith VELION FIB-SEM in the MIT.nano Characterization Facilities (Award: DMR-2117609)"

Related Tools
FEI Helios Nanolab 600 Dual Beam System

FEI Helios Nanolab 600 Dual Beam System

Staff/Contact

Juan Fererra
12-0178
MIT.nano (basement level)
60 Vassar Street (rear)
Cambridge, MA

Anna Osherov, PhD
12-5005
MIT.nano (5th floor)
60 Vassar Street (rear)
Cambridge, MA

CONTACT

ASSISTED USE / TRAINING REQUEST

 

Reservation Rules

Prior electron microscopy imaging experience is required to become an independent user

Location

12-0189
MIT.nano (basement level)
60 Vassar Street (rear)
Cambridge, MA