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VELION is a FIB-SEM instrument dedicated to nanofabrication where Focused Ion Beam (FIB) technology has matured into state-of-the-art instrumentation for nanofabrication and rapid prototyping. VELION comprises a top down mounted nanoFIB column perpendicular to a Laser Interferometer Stage with an attached FE SEM column. The instrument offers unique capabilities and is highly optimized for fabricating high resolution, 2D and 3D nanostructures.


nanoFIB column:

  • Liquid Metal Alloy Ion Sources (LMAIS) providing Wien filtered ions for Gallium-free patterning (Au, Ge, Si)
  • High resolution patterning capabilities (min feature size < 15nm for Au/Si)
  • Fully corrected write fields (distortion, stigmation)
  • Long term current stability (up to days)

Laser Interferometer stage:

  • Mechanical movement at 1nm precision
  • Continuous stage modes for stitch free FIB patterning on full 4”wafer scale
  • Stitching and overlay accuracy:  < 50 nm (|mean|+3·sigma)


  • Process control for rapid prototyping

Additional Capabilities:  

  • Automated height sensing to detect sample surface height variation for automated correction
  • Pt GIS deposition
  • Nanomanipulator
  • Raith Nanosuite software incl. CAD (GDSII) navigation & patterning
  • Plasmonic devices
  • Meta materials
  • Localized Ion implantation
  • Nanophotonics
  • Waveguides
  • Fresnel lenses
  • Nanofluidics
  • Nanopore fabrication on waferscale
  • Large area FIB hard masking
  • Ga-free TEM-L prep

VELION FIB-SEM acquisition was enabled by National Science Foundation Major Research Instrumentation Program (NSF-MRI). Please make sure to acknowledge DMR-2117609 in any publication involving results originated from the use of the VELION.

Suggested language: " This work was performed in part on the Raith VELION FIB-SEM in the MIT.nano Characterization Facilities (Award: DMR-2117609)"


MIT.nano (basement level)
60 Vassar Street (rear)
Cambridge, MA

  Self Use 
Staff Assisted 
MIT Academics    81.90 141.40
Other Academics 117.00 202.00
External                351.00 606.00


* Introductory rates valid for 2020


Reservation Rules

Prior electron microscopy imaging experience is required to become an independent user


Yang Yu, PhD
Raith Application Scientist


Anna Osherov, PhD
MIT.nano (5th floor)
60 Vassar Street (rear)
Cambridge, MA