Past Events

The PANalytical X'Pert Pro diffractometer is an excellent choice for X-ray powder diffraction (XRPD). The default mode of this instrument is in Bragg-Brentano parafocusing geometry, which is used for polycrystalline materials. We usually keep a linear position sensitive detector on the instrument, which permits rapid data collection for angles higher than 4 degrees 2Theta.

The basic instrument training session will focus on the collection of powder diffraction data using the high-speed optics, which consist of programmable divergence slits and X'Celerator high-speed detector, and the Open Eularian Cradle (OEC) sample stage. This configuration is best suited for high-speed high-resolution data collection from powders and polycrystalline thin films.

Accessories include several different sample stages and optics. After you have completed this training, you can request individaul training on the other configurations available with this instrument. There are three other sample stages that are available: (1) the 15 position automatic sample changer, (2) the furnace that can heat samples up to 1200 C, and (3) the cyrostat that can cool samples down to 11 K. The PANalytical also can be configured parallel-beam optics for grazing incidence X-ray diffraction (GIXD). After you have completed the basic training, you can request individual training on using the other configurations.

Users of this instrument should also strongly consider taking a data analysis course to suit their needs, such as the line profile fitting course for crystallite size and microstrain analysis, the Rietveld refinement series for quantitative phase analysis and unit cell analysis, or the Introduction to High Score Plus for qualitative phase identification and database search techniques.
 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This training event will focus on the basic imaging and operation of the Bruker Icon AFM available at MIT.nano Characterization Facilities. Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. Users can bring their own samples for this training and SPM probes are provided. Notice, users must supply their own probes for followup qualification sessions. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff member during this small group training.

The Icon XR has many SPM modes including contact and PeakForce tapping mode with ScanAsyst, Magnetic Force Microscopy, Piezo Force Microscopy, conducting atomic force microscopy (AFM). There are also additional features such as electrical characterization from 80 fA to 1 uA with 10 nm spatial resolution, Kelvin Force Probe Microscopy with amplitude or frequency feedback, and pixel-by-pixel quantitative force characterization to probe material properties. Following the basic training session, users can coordinate an advanced mode specific training with the MIT.nano staff.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA HD VP available at Characterization.nano. Users will learn about specifics of the instrument configurations, different imaging detectors available and strategies for image quality improvement. We'll use standard sample for this training. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff me. 

Active MIT.nano user account  (MUMMS) is required to participate in this training. Please setup an account prior to registering for the training event. 

Characterization.nano orientation provides an introduction to MIT.nano advanced measurement and characterization capabilities with emphasis on the state-of-the-art equipment located outside the MIT.nano cleanroom facilities and in build 13.

Completion is recommended to those interested in accessing Characterization.nano instrumentation located in the non-cleanroom spaces only. Those seeking to access metrology instrumentation located both inside and outside the cleanroom facilities, have to complete MIT.nano fab and metrology combined orientation. The MIT.nano characterization orientation components include:

1. Broad overview of the different facilities and capabilities at MIT.nano. Emphasis will be made on advanced imaging and analysis capabilities;
2. Background on how work is conducted on MIT.nano's shared equipment;
3. Brief overview of characterization work safety rules;
4. Virtual Tour through the different characterization lab spaces. Participants are encouraged to ask questions to relate MIT.nano capabilities to their research interests and needs.

After registering, you will get an email with zoom link to the orientation event.

All users without previous cleanroom work experience are required to take the quick-start training. Waivers for prior experience will be handled during the Fab.nano orientation.

The quick-start provides hands-on training to new users, by following through a simple 1-mask process in a small group. You will gain familiarity with entering the lab, handling samples, learn about deposition, lithography and etch tools, and how to verify process results.

An active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

Because we are working in the lab, please wear long pants and full shoes

Please have the Fab.nano Orientation completed before the quick-start event.

This training event will focus on the basic imaging and operation of the Cypher S and VRS AFM's available at MIT.nano Characterization Facilities. Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. Users can bring their own samples for this training and SPM probes are provided. Notice, users must supply their own probes for followup qualification sessions. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

The orientation consists of a series of self-paced videos to watch, and a 30-minute check-in over zoom, where we provide an introduction, answer questions about the lab & capabilities and how to get started, and check for any missing trainings. All cleanroom and packaging space users need to complete the orientation before card access can be granted.

Users with no prior cleanroom experience also take a half-day “quick-start” class, which provides a hands-on experience in core methods (deposition, lithography, etch). Users with prior cleanroom experience will receive a waiver during the orientation check-in. If you only need to use the packaging space (and not the cleanroom), the quick-start is not needed.

Registering for the orientation, you will get a chance to describe your general fabrication needs, helping us better understand each user’s goals and expectations. The registration form also contains a checklist to help you spot any missing EHS trainings.

After registering, you will get an email with a link to the videos to watch, and the zoom link to the orientation event.

This course will teach you how to profile fit data in the program HighScore Plus.  Profile fitting is the first step to quantification of XRPD data.  Profile fitting allows a user to extract precise information about peak position, intensity, and width. Once XRPD data have been profile fit, a variety of calculations are possible. This session will focus on refining unit cell lattice parameters, indexing diffraction data, % crystallinity, and calculating the relative weight fractions of phases in a mixture (quantitative phase analysis). 

Additional workshops will focus on calculating nanocrystallite size and microstrain from peak broadening. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic theory and operation of the Quantum Design Inc. Magnetic Property Measurement System (MPMS-3). Users will learn about specifics of the instrument capabilities and strategies for data collection and data quality improvement. 

Please review the MPMS Introduction video prior to the training

After this session you can schedule time to run your sample(s).
 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.