Past Events

Oxford Instruments Asylum Research AFM & WITec Raman is holding a day-long, in-person workshop with morning presentations (12-0168 ) and afternoon hands-on applications topics (12-0145). Please join us for an informative day on advanced AFM and Raman capabilities at MIT.nano.

WORKSHOP SCHEDULE

9:15 AM – 9:30 AM
Welcome (Coffee and pastries sponsored by Oxford Instruments)

9:30 AM – 10:30 AM
What can I measure with an Atomic Force Microscope? Advanced AFM modes for materials characterization
Ted Limpoco, Ph.D., Senior Applications Scientist, Oxford Instruments Asylum Research

10:30 AM – 11:30 AM
Molecular visualization of 2D materials with correlative microscopy
Ute Schmidt, Applications Manager, WITec Raman

11:30 AM – 12:30 PM
Raman spectroscopy of cementitious materials
Admir Mašić, Associate Professor of Civil and Environmental Engineering, MIT

12:30 PM – 1:30 PM
Lunch sponsored by Oxford Instruments

1:30 PM – 2:00 PM
Atomic Force Microscopy of 2D materials
Ted Limpoco, Ph.D., Senior Applications Scientist, Oxford Instruments Asylum Research

2:00 PM – 5:00 PM
Afternoon hands-on workshop for most common applications using the Cypher VRS AFM and WITec Raman at MIT.nano (Location: 12-0195).

TALK DETAILS

LOCATION: 12-0168
TIME: 9:30 AM - 10:30 AM

TITLE: What can I measure with an Atomic Force Microscope? Advanced AFM modes for materials characterization
SPEAKER: Ted Limpoco, Ph.D., Senior Applications Scientist, Oxford Instruments Asylum Research

Atomic force microscopes (AFMs) are fundamentally visualization tools with the ability to routinely resolve topographic features of surfaces at the nanometer scale. At its highest performance, AFMs can resolve even atomic lattices and point defects. AFMs also use a mechanical probe, such that it essentially “touches” the surface, so we can obtain more information than just topography. Contact or proximity to the surface enable us to measure material properties, such as mechanical, electrical, and magnetic properties. Since the probe tip is very small, we can get very local information, mapping this on surface topography with nanometer detail. AFMs have thus become an indispensable tool in nanotechnology research.

In this presentation, we will survey advanced AFM modes that measure properties such as Young’s modulus, adhesion, and viscoelastic response (force curves, FFM, AMFM, DART-CR); current (CAFM); surface potential and work function (KPFM or SKPM); electric charge and magnetic field (EFM and MFM); capacitance, as well as dopant levels and type (SCM); and, finally, electromechanical or piezoelectric response (DART™-PFM). In the process, we will touch on advances in multi-frequency modes (DART™, AM-FM), modern methods of cantilever excitation (blueDrive™ photothermal excitation), capturing biomolecular dynamics (video-rate scanning), and imaging under environmental control.

We will highlight capabilities of Asylum Research AMF tools available at MIT.nano, such as the Cypher VRS and Jupiter XR. In addition, we'll introduce Vero AFM featuring quadrature phase differential interferometric (QPDI™) technology.

These various measurement modes, combined with its ultrahigh resolution, highlight the strength and versatility of AFMs in materials characterization and nanotechnology research.

TIME: 10:30 AM - 11:30 AM

TITLE: Molecular visualization of 2D materials with correlative microscopy
SPEAKER: Ute Schmidt, Applications Manager, WITec Raman

The great success of graphene [1] kicked off the rapid growth in research on materials consisting of only one or a few layers of atoms, defined as 2D materials. In addition to graphene, other 2D materials such as transition metal dichalogenides (TMDs) have attracted increasingly attention due to their remarkable electronic and optical properties. Graphene [1,2] and TMDs [3,4] have a layered structure in common and experience significant changes in their properties with layer thickness, making them very attractive materials for electronics design [5]. For applied research and their integration with electronic circuits and sensors, the quality of the 2D materials is of great interest in terms of defects such as wrinkles, folding or lattice mismatches [6-8]. Importantly, the optical and electronic properties of 2D materials are strongly influenced by the stacking disorder [9]. 

The characterization tool of choice for these types of 2D materials should be non-destructive, fast, with high resolution and capable of providing comprehensive structural, optical and electronic information. This implies the combination of more than one characterization techniques to obtain a thorough understanding of their attributes for specific applications.

This talk provides insight into how optical spectroscopic imaging (Raman/Photoluminescence/SHG) in combination with AFM, contributes to an comprehensive characterization of such 2D materials. 

REFERENCES

1. K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva and A. A. Firsov, Science 306 (2004) 666.
2. Geim A. K., Grigorieva I. V., Nature 499 (2013) 419.
3. M. Xu, T. Liang, M. Shi and H. Chen, Chem. Rev. 113 (2013) 3766 
4. J.A. Wilson & A.D. Yoffe , Advances in Physics, 18-73 (1969)193.
5. Koppens F. H. L., Nueller T., Avouris P., Ferrari A.C., Vitiello M. S., Polini M., M. Nat. Nano 9 (2014) 780.
6. You Y., Ni Z., Yu T., Shen Z., Appl. Phys. Letters 93 (2008) 1.
7. T. Ohta, T. Becheem, J.T. Robinson, G.L. Kellogg, Phys. Rev B 85 (2012) 75415.
8.  S. D. Costa, J. E. Weis, O. Frank, M. Kalbac, Carbon 98 (2016) 592.
9. Y. Chen, L. Meng, W. Zhao, Z. Liang, X. Wu, H. Nan, Z. Wu, S. Huang, L. Sun, J. Wang, and Z. Ni, Phys. Chem. Chem. Phys. 16 (2014) 21682.

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA 300, Zeiss Gemini 450 and Zeiss Merlin SEM's available at Characterization.nano. Users will learn about specifics of the instrument configurations, different imaging detectors available and strategies for image quality improvement. Users can bring their own samples for this training. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use session that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

The Wet Chemical Process Training provides an introduction for all work with liquid chemicals in Fab.nano. Completion is required for any use of fume hoods or wet benches (including solvents, hands-on training for spin coaters, corrosive hoods and wet benches).

The training is also a prerequisite for 24-hour access to the Fab.nano facility, as it provides the relevant safety foundations.

This group training event will focus on the basic theory and operation of the Fourier Transform Infrared Spectrometer 
Users will learn about specifics of the instrument configurations, available accessories and strategies for data collection and data quality improvement. Users can bring their own (non-hazardous) samples for this training in whatever form is convenient. We will work together until we are both comfortable with your safe and successful operation of the instrument in a shared facility environment. This is usually one session <2hours. Full independent tool access will be granted upon completion of this training session.
 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This group training event will focus on the basic imaging and operation of the Zeiss SIGMA HD VP available at Characterization.nano. Users will learn about specifics of the instrument configurations, different imaging detectors available and strategies for image quality improvement. We'll use standard sample for this training. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff me. 

Active MIT.nano user account  (MUMMS) is required to participate in this training. Please setup an account prior to registering for the training event. 

Characterization.nano orientation provides an introduction to MIT.nano advanced measurement and characterization capabilities with emphasis on the state-of-the-art equipment located outside the MIT.nano cleanroom facilities and in build 13.

Completion is recommended to those interested in accessing Characterization.nano instrumentation located in the non-cleanroom spaces only. Those seeking to access metrology instrumentation located both inside and outside the cleanroom facilities, have to complete MIT.nano fab and metrology combined orientation. The MIT.nano characterization orientation components include:

1. Broad overview of the different facilities and capabilities at MIT.nano. Emphasis will be made on advanced imaging and analysis capabilities;
2. Background on how work is conducted on MIT.nano's shared equipment;
3. Brief overview of characterization work safety rules;
4. Virtual Tour through the different characterization lab spaces. Participants are encouraged to ask questions to relate MIT.nano capabilities to their research interests and needs.

After registering, you will get an email with zoom link to the orientation event.

All users without previous cleanroom work experience are required to take the quick-start training. Waivers for prior experience will be handled during the Fab.nano orientation.

The quick-start provides hands-on training to new users, by following through a simple 1-mask process in a small group. You will gain familiarity with entering the lab, handling samples, learn about deposition, lithography and etch tools, and how to verify process results.

An active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.

Because we are working in the lab, please wear long pants and full shoes

Please have the Fab.nano Orientation completed before the quick-start event.

This training event will focus on the basic imaging and operation of the Cypher S and VRS AFM's available at MIT.nano Characterization Facilities. Starting from the basic principles of AFM, users will also learn about cantilever selection and installation, different imaging modes, image quality improvement, and data processing and analysis methods. Users can bring their own samples for this training and SPM probes are provided. Notice, users must supply their own probes for followup qualification sessions. Full independent tool access will be granted upon completion of 2 additional one-on-one supervised use sessions that will be coordinated with the staff member during this small group training. 

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event. 

This class will teach the basics of collecting data using the Rigaku SmartLab with divergent beam and parallel-beam optics.  The focus will be data collection from polycrystalline thin films using X-Ray Powder Diffraction (XRPD) techniques and Grazing Incidence X-Ray Diffraction (GIXD).  The techniques will be applicable to other types of samples, such as powders and pellets. In addition, the basics of collecting X-ray reflectivity (XRR) data will be covered.

Active MIT.nano user account is required to participate in this training. Please setup an account prior to registering for the training event.